Facilities and expertise
We will provide our facilities, service and expertise to support your research.
The main capabilities of our unique in-house developed HS-LEIS analytical systems are:
- Accurate quantitative measurement of surface coverage and atomic composition of the outermost atomic layer
- Depth analysis with extreme resolution up to a depth of 10 nm
Also, various options for pre-treatment and analysis dedicated to your application are available. These include charge compensation for insulators, sample heating in a special atmosphere, and secondary electron imaging.